Share Email Print
cover

Proceedings Paper

Performance analysis of cryogenic silicon Laue monochromators at APS undulators
Author(s): Bingxin X. Yang; Mati Meron; Yifei Ruan; Wilfried Schildkamp
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We investigated the performance of a cryogenically cooled silicon monochromator crystal exposed to high power x-ray undulator radiation. The heat transfer in this nonlinear material was studied analytically by approximating the thermal conductivity and then scaling relations for the temperature distributions with the cooling temperature and the power load were found. The strain distributions in this nonlinear material were studied analytically by approximating the thermal expansion coefficient. The broadening of the rocking curve was found to be determined, to the first order, by the maximum temperature and a load factor (gamma) which is determined by the properties of the source and the crystal, and independent of the optical geometry. Major conclusions were verified through numerical analysis with the program ANSYS. We concluded that cryogenically cooled silicon Laue monochromator should work with Undulator A at the Advanced Photon Source.

Paper Details

Date Published: 12 November 1993
PDF: 14 pages
Proc. SPIE 1997, High Heat Flux Engineering II, (12 November 1993); doi: 10.1117/12.163808
Show Author Affiliations
Bingxin X. Yang, Univ. of Chicago (United States)
Mati Meron, Univ. of Chicago (United States)
Yifei Ruan, Univ. of Chicago (United States)
Wilfried Schildkamp, Univ. of Chicago (United States)


Published in SPIE Proceedings Vol. 1997:
High Heat Flux Engineering II
Ali M. Khounsary, Editor(s)

© SPIE. Terms of Use
Back to Top