Share Email Print

Proceedings Paper

Some oxide films deposited by reactive low-voltage plasma-assisted evaporation
Author(s): Xu Liu; Bin Wang; Gan Wang; Peifu Gu; Jinfa Tang
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Low voltage plasma assisted evaporation (PAE) technique has been investigated as an effective evaporation technique for the deposition of oxide films of high optical performance. The PAE process consists of an electron beam evaporator and a large current plasma source. The guided wave method is used to measure the refractive index and attenuation coefficients of guided modes of some oxide films deposited by PEA. The experimental systems and results are presented.

Paper Details

Date Published: 25 November 1993
PDF: 7 pages
Proc. SPIE 2000, Current Developments in Optical Design and Optical Engineering III, (25 November 1993); doi: 10.1117/12.163657
Show Author Affiliations
Xu Liu, Zhejiang Univ. (China)
Bin Wang, Zhejiang Univ. (China)
Gan Wang, Zhejiang Univ. (China)
Peifu Gu, Zhejiang Univ. (China)
Jinfa Tang, Zhejiang Univ. (China)

Published in SPIE Proceedings Vol. 2000:
Current Developments in Optical Design and Optical Engineering III
Robert E. Fischer; Warren J. Smith, Editor(s)

© SPIE. Terms of Use
Back to Top