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Proceedings Paper

New electronic shearing speckle pattern interferometer with continuously variable sensitivity
Author(s): Nai-Keng Bao; G. C. Jin; Po Sheun Chung
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Paper Abstract

A new Electronic Shearing Speckle Pattern Interferometer (ESSPI) with continuously variable sensitivity is described. This new instrument not only provides variable sensitivity and improved shearing range but it also increases the maximum shearing sensitivity. It will be well suited to nondestructive testing applications in industry.

Paper Details

Date Published: 22 October 1993
PDF: 4 pages
Proc. SPIE 2066, Industrial Optical Sensing and Metrology: Applications and Integration, (22 October 1993); doi: 10.1117/12.162091
Show Author Affiliations
Nai-Keng Bao, City Polytechnic of Hong Kong (Hong Kong)
G. C. Jin, Tsinghua Univ. (Hong Kong)
Po Sheun Chung, City Polytechnic of Hong Kong (Hong Kong)


Published in SPIE Proceedings Vol. 2066:
Industrial Optical Sensing and Metrology: Applications and Integration
Kevin G. Harding; H. Philip Stahl, Editor(s)

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