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Proceedings Paper

Structure study on electrochromic films of nickel oxide
Author(s): Xingfang Hu; Xiaofeng Chen; Xiangyun Song
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Paper Abstract

Using HREM, the relationship between structure and electrochromic properties of rf diode sputtered nickel oxide films with good and poor electrochromic performance has been investigated. The experimental results indicate that all two kinds of films consist of cubic nickel oxide with nano-crystal structure. For the films having good electrochromic properties, the grain size ranges about 5 - 10 nm. In the films exhibiting poor performance, an amorphous phase of nickel oxide as a continuous phase existing in the film has been observed and the cubic nickel oxide grains appear as isolate island existing in the amorphous phase. From the structural features of the films, it may be concluded that the grain boundary of nano- polycrystalline structure plays an important role in the electrochromic reaction and the grain boundary would act as channel for the injection and extraction of alkali metal ions and electrons during the coloring and bleaching process. So, it is important to control the structure of films in the deposition process to prepare the film with good electrochromic performance.

Paper Details

Date Published: 22 October 1993
PDF: 10 pages
Proc. SPIE 2017, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XII, (22 October 1993); doi: 10.1117/12.161957
Show Author Affiliations
Xingfang Hu, Shanghai Institute of Ceramics (China)
Xiaofeng Chen, Shanghai Institute of Ceramics (China)
Xiangyun Song, Shanghai Institute of Ceramics (China)


Published in SPIE Proceedings Vol. 2017:
Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XII
Carl M. Lampert, Editor(s)

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