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Proceedings Paper

Optomechanical design of 50-mm displacement measuring apparatus with nanometer accuracy
Author(s): Yi-Ru Zhang; Ye-Qing Zhu; Zu-Shan Shen
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Paper Abstract

This paper describes the application of a two-frequency heterodyne interferometry in the micro-displacement measurement, and discusses the optomechanical design of the displacement measuring apparatus with high precision, long measuring range, high moving sensitivity, and high stability. The measuring uncertainty of this apparatus is +/- 7 X 10-3 micrometers within a 5 X 104 micrometers measuring range. This apparatus is mainly used in testing and calibrating linear displacement sensors.

Paper Details

Date Published: 16 September 1993
PDF: 10 pages
Proc. SPIE 1998, Optomechanical Design, (16 September 1993); doi: 10.1117/12.156625
Show Author Affiliations
Yi-Ru Zhang, Shanghai Institute of Metrological Technology (China)
Ye-Qing Zhu, Shanghai Institute of Metrological Technology (China)
Zu-Shan Shen, Shanghai Institute of Metrological Technology (China)


Published in SPIE Proceedings Vol. 1998:
Optomechanical Design
Daniel Vukobratovich; Paul R. Yoder; Victor L. Genberg, Editor(s)

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