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Proceedings Paper

New initiation system for photopolymer holographic recording material
Author(s): Cunlin Zhang; Meiwen Yu; Yongyuan Yang; Jun Li; Er-jian Wang
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Paper Abstract

Some p-N,N-dimethylamine and diethylamine substituted benzal ketone derivatives (ABK) are used as a new class of sensitizer for laser light induced radical photopolymerization of N-vinyl carbazole (NVC) and methacrylic acid benzal ester (MABE) by combination with diphenyliodonium salt (DPIO). The relative efficiency of various ABK for polymerization of NVC and MABE to record holograms is in the order DEBP>DABA>ABA. An argon ion laser (488 nm) is used for exposure .Trichromatic filters were made with the material.

Paper Details

Date Published: 17 September 1993
PDF: 5 pages
Proc. SPIE 1914, Practical Holography VII: Imaging and Materials, (17 September 1993); doi: 10.1117/12.155012
Show Author Affiliations
Cunlin Zhang, Beijing Institute of Technology (China)
Meiwen Yu, Beijing Institute of Technology (China)
Yongyuan Yang, Institute of Photographic Chemistry (China)
Jun Li, Institute of Photographic Chemistry (China)
Er-jian Wang, Institute of Photographic Chemistry (China)

Published in SPIE Proceedings Vol. 1914:
Practical Holography VII: Imaging and Materials
Stephen A. Benton, Editor(s)

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