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Proceedings Paper

Effect of using a resin coating on KrF chemically amplified positive resists
Author(s): Akira Oikawa; Nobuaki Santoh; Shuichi Miyata; Yasunori Hatakenaka; Hiroyuki Tanaka; Kenji Nakagawa
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Paper Abstract

We tried several resins to protect chemically amplified positive resists from contaminants such as ammonia and amines. Polymethyl silsesquioxane (PMSS), a hydrophobic resin, significantly reduced the severity of T-tops and improved delay-time stability. Polyolefinic resin (POR) was the most effective hydrophobic resin and improved the performance of all chemically amplified resists we tried. The pattern profiles were not significantly affected by the protective resin thickness; resin films from 400 angstroms to 9500 angstroms were equally effective. We also used resin coatings to identify when resists are contaminated. We found that contamination begins just after exposure and continues to the end of postexposure bake (PEB).

Paper Details

Date Published: 15 September 1993
PDF: 9 pages
Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); doi: 10.1117/12.154809
Show Author Affiliations
Akira Oikawa, Fujitsu Ltd. (Japan)
Nobuaki Santoh, Fujitsu Ltd. (Japan)
Shuichi Miyata, Fujitsu Ltd. (Japan)
Yasunori Hatakenaka, Fujitsu Ltd. (Japan)
Hiroyuki Tanaka, Fujitsu Ltd. (Japan)
Kenji Nakagawa, Fujitsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 1925:
Advances in Resist Technology and Processing X
William D. Hinsberg, Editor(s)

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