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Proceedings Paper

Blended novolac resins with improved lithographic performance
Author(s): Thomas J. Lynch; Chet J. Sobodacha; Valerie R. Paradis; Dana L. Durham; Anthony Canize
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Paper Abstract

Statistically designed experiments were performed to optimize novolac blending techniques which would yield superior photoresists. The best lithographic performance was obtained when two novolacs to be blended had dissimilar relative molecular weights (RMW) while also having matched dissolution rates (DR), (lithographic performance equals (RMWA - RMWB)/(DRA - DRB). A calculated plot of (RMWA - RMWB)/(DRA - DRB) matched the experimental plot of lithographic performance well.

Paper Details

Date Published: 15 September 1993
PDF: 9 pages
Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); doi: 10.1117/12.154795
Show Author Affiliations
Thomas J. Lynch, Hoechst Celanese Corp. (United States)
Chet J. Sobodacha, Hoechst Celanese Corp. (United States)
Valerie R. Paradis, Hoechst Celanese Corp. (United States)
Dana L. Durham, Hoechst Celanese Corp. (United States)
Anthony Canize, Hoechst Celanese Corp. (United States)

Published in SPIE Proceedings Vol. 1925:
Advances in Resist Technology and Processing X
William D. Hinsberg, Editor(s)

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