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Proceedings Paper

Molecular design for stabilization of chemical amplification resist toward airborne contamination
Author(s): Hiroshi Ito; William Preston England; Nicholas J. Clecak; Gregory Breyta; Hoosung Lee; Do Y. Yoon; Ratnam Sooriyakumaran; William D. Hinsberg
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Paper Abstract

This paper describes the first logical approach to the design of chemical amplification resists that are stable toward airborne contamination. This molecular design is based on the observation that uptake of N-methylpyrrolidone (NMP) by thin polymer films is primarily governed by glass transition temperatures (Tg) of the polymers. This concept has led to the design of environmentally very robust chemical amplification resists that provide positive images upon development with aqueous base.

Paper Details

Date Published: 15 September 1993
PDF: 11 pages
Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); doi: 10.1117/12.154794
Show Author Affiliations
Hiroshi Ito, IBM Almaden Research Ctr. (United States)
William Preston England, IBM Almaden Research Ctr. (United States)
Nicholas J. Clecak, IBM Almaden Research Ctr. (United States)
Gregory Breyta, IBM Almaden Research Ctr. (United States)
Hoosung Lee, IBM Almaden Research Ctr. (United States)
Do Y. Yoon, IBM Almaden Research Ctr. (United States)
Ratnam Sooriyakumaran, IBM Almaden Research Ctr. (United States)
William D. Hinsberg, IBM Almaden Research Ctr. (United States)


Published in SPIE Proceedings Vol. 1925:
Advances in Resist Technology and Processing X
William D. Hinsberg, Editor(s)

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