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Proceedings Paper

Composition of inorganic photoresists and its EBE experiment
Author(s): Changtai Yu; Hua Yu; Fengzhen Guo; Songzu Xu; Zhougfu Qi; Xiangdong Yu; Yongkuan Liu; Li Peng; Zhongyi Zhang
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Paper Abstract

We report the composition of inorganic photoresist, film making way and its EBE experiment. With the composed inorganic photoresist, the graph of 0.6 micrometers line width is gained in our experiment.

Paper Details

Date Published: 15 September 1993
PDF: 5 pages
Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); doi: 10.1117/12.154787
Show Author Affiliations
Changtai Yu, Zhejiang Univ. (China)
Hua Yu, Zhejiang Univ. (China)
Fengzhen Guo, Zhejiang Univ. (China)
Songzu Xu, Zhejiang Univ. (China)
Zhougfu Qi, Zhejiang Univ. (China)
Xiangdong Yu, Wu Xi Microelectronics Complex (China)
Yongkuan Liu, Wu Xi Microelectronics Complex (China)
Li Peng, Wu Xi Microelectronics Complex (China)
Zhongyi Zhang, Wu Xi Microelectronics Complex (China)

Published in SPIE Proceedings Vol. 1925:
Advances in Resist Technology and Processing X
William D. Hinsberg, Editor(s)

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