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Proceedings Paper

Hydrosiloxane-modified styrene-diene block copolymer resists
Author(s): Allen H. Gabor; Eric A. Lehner; Guoping Mao; Christopher Kemper Ober; Timothy E Long; Brian A. Schell; Richard C. Tiberio
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Paper Abstract

Block copolymers are a class of polymers deserving of more investigation by the resist community. We are investigating styrene-hydrosiloxane modified diene block copolymers which have good properties for use as negative tone, electron sensitive resists. Resolution better than 0.1 micrometers , sensitivity of 30 (mu) C/cm2 and contrast of 2.8 have been demonstrated using a poly(styrene)-pentamethyldisiloxane modified poly(isoprene) block copolymer (PS-b-PDPI). Used in a bilayer resist scheme, PS-b-PDPI has an oxygen RIE selectivity ratio of 42 with respect to poly(imide). A poly(styrene)-heptamethyltrisiloxane modified poly(butadiene) block copolymer (PS-b-HTPB) has an oxygen RIE selectivity ratio of 54 with respect to poly(imide). In a bilayer resist system, using PS-b-PDPI as the imageable layer, patterns of 0.3 micrometers wide lines and 1.5 micrometers wide spaces have been transferred through a 1.2 micrometers thick poly(imide) planarizing layer.

Paper Details

Date Published: 15 September 1993
PDF: 8 pages
Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); doi: 10.1117/12.154785
Show Author Affiliations
Allen H. Gabor, Cornell Univ. (United States)
Eric A. Lehner, Cornell Univ. (United States)
Guoping Mao, Cornell Univ. (United States)
Christopher Kemper Ober, Cornell Univ. (United States)
Timothy E Long, Eastman Kodiak Co. (United States)
Brian A. Schell, Eastman Kodak Co. (United States)
Richard C. Tiberio, Cornell Univ. (United States)

Published in SPIE Proceedings Vol. 1925:
Advances in Resist Technology and Processing X
William D. Hinsberg, Editor(s)

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