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Proceedings Paper

Experimental investigation of high-focus latitude concepts
Author(s): Medhat A. Toukhy; Sydney G. Slater; John E. Ferri
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Paper Abstract

The purpose of this paper is to investigate experimentally the important concepts affecting resist focus latitude. Exposure margin (EM), contrast, inhibition, and the newly introduced parameter (RD/EM) were investigated for a variety of resist systems. The quantity (RD), is the removal dose for some fractional film thickness near mask edge. The resist examples employed in this study included positive and negative, chemically amplified resists and novolac/DNQ systems. It is concluded in this work that the focus tolerance of the resist is influenced largely by (EM) in one direction and by resist inhibition and contrast in the other.

Paper Details

Date Published: 15 September 1993
PDF: 15 pages
Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); doi: 10.1117/12.154782
Show Author Affiliations
Medhat A. Toukhy, OCG Microelectronic Materials, Inc. (United States)
Sydney G. Slater, OCG Microelectronic Materials, Inc. (United States)
John E. Ferri, OCG Microelectronic Materials, Inc. (United States)


Published in SPIE Proceedings Vol. 1925:
Advances in Resist Technology and Processing X
William D. Hinsberg, Editor(s)

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