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Proceedings Paper

Design of PACs for high-performance photoresists (II): effect of number and orientation of DNQs and -OH of PACs on lithographic performances
Author(s): Ryotaro Hanawa; Yasunori Uetani; Makoto Hanabata
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Paper Abstract

PACs which have a defined number of DNQs and -OH groups were synthesized with high yield by the selective esterification method, and the relationship between number and orientation of DNQs, and lithographic performances and dissolution properties, were examined and measured by puddle development. From our present and previous examinations, it is concluded that existence of one -OH group and two DNQs, which are separated from each other on a ballast molecule, is the most preferable structure of PAC, which provides a photoresist not only a high (gamma) -value and resolution capability but also suitable sensitivity and a scum-free pattern. According to concept of polyphotolysis results are discussed quantitatively by dissolution inhibition effect and the number of DNQs of the PAC.

Paper Details

Date Published: 15 September 1993
PDF: 8 pages
Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); doi: 10.1117/12.154756
Show Author Affiliations
Ryotaro Hanawa, Sumitomo Chemical Co., Ltd. (Japan)
Yasunori Uetani, Sumitomo Chemical Co., Ltd. (Japan)
Makoto Hanabata, Sumitomo Chemical Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 1925:
Advances in Resist Technology and Processing X
William D. Hinsberg, Editor(s)

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