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Proceedings Paper

1,3-dioxolyl acetals as powerful crosslinkers of phenolic resin
Author(s): Ulrich P. Schaedeli; Norbert Muenzel; Heinz E. Holzwarth
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Paper Abstract

The principle of chemical amplification has proven to be successful for the design of highly sensitive, high resolution resist materials of both positive and negative tone, respectively. This paper discusses our new approach to a high resolution, aqueous base developable deep-UV negative tone resist. It is based on the acid catalyzed cleavage of acetal blocked aromatic aldehydes, which, if treated with strong Broensted acid, react with the surrounding phenolic resin in a Friedel-Crafts type reaction, thereby leading to matrix crosslinking. Resists based on this type of crosslinking chemistry show good deep-UV transparency, have high sensitivity, and can be developed with an aqueous base.

Paper Details

Date Published: 15 September 1993
PDF: 11 pages
Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); doi: 10.1117/12.154743
Show Author Affiliations
Ulrich P. Schaedeli, Ciba-Geigy AG (United States)
Norbert Muenzel, OCG Microelectronic Materials AG (Switzerland)
Heinz E. Holzwarth, OCG Microelectronic Materials AG (Switzerland)


Published in SPIE Proceedings Vol. 1925:
Advances in Resist Technology and Processing X
William D. Hinsberg, Editor(s)

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