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Proceedings Paper

Ion-assisted deposition of oxide films
Author(s): Hedva Zipin; Orna Marcovitch; Y. Refaeli; Yigal Yadin; Zeev Klein
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Paper Abstract

Various oxide films were prepared by oxygen ion-assisted deposition. The ion source (Mark II Gridless Ion source, manufactured by Commonwealth Scientific Corp.) uses the End-Hall configuration and generates high-current, low-energy beams of ions. Films of TiO2, SiO2, Al2O3, Y2O3 were deposited on substrates in temperatures ranging from ambient to 200 degree(s)C. The films had a high index of refraction, were hard and adhered strongly to the substrates, as compared to conventionally deposited oxide films. Multilayers of TiO2/SiO2 were prepared giving hard and environmentally stable coatings.

Paper Details

Date Published: 13 August 1993
PDF: 1 pages
Proc. SPIE 1972, 8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine, (13 August 1993); doi: 10.1117/12.151104
Show Author Affiliations
Hedva Zipin, Rafael (Israel)
Orna Marcovitch, Rafael (Israel)
Y. Refaeli, Rafael (Israel)
Yigal Yadin, Rafael (Israel)
Zeev Klein, Rafael (Israel)


Published in SPIE Proceedings Vol. 1972:
8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine

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