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Proceedings Paper

Photoresists based on chalcogenide glasses for submicron lithography
Author(s): Illana Bar; Matvei Klebanov; Victor Lyubin; Salman Rosenwaks; S. Shtutina; V. Volterra
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Paper Abstract

It is shown that the photosensitivity of photoresists based on chalcogenide glasses can be increased drastically (1000 times and more) using excitation by pulsed radiation of excimer laser. A model is developed that explains the increase in sensitivity. The main advantages of chalcogenide photoresists are discussed and conclusions are drawn on the prospects of these resists for submicron photolithography.

Paper Details

Date Published: 13 August 1993
PDF: 7 pages
Proc. SPIE 1972, 8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine, (13 August 1993); doi: 10.1117/12.151100
Show Author Affiliations
Illana Bar, Ben-Gurion Univ. of the Negev (Israel)
Matvei Klebanov, Ben-Gurion Univ. of the Negev (Israel)
Victor Lyubin, Ben-Gurion Univ. of the Negev (Israel)
Salman Rosenwaks, Ben-Gurion Univ. of the Negev (Israel)
S. Shtutina, Ben-Gurion Univ. of the Negev (Israel)
V. Volterra, Ben-Gurion Univ. of the Negev (Israel)


Published in SPIE Proceedings Vol. 1972:
8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine

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