Share Email Print
cover

Proceedings Paper

Design and manufacture of optical system for use in ultraviolet lithography with the free-electron laser
Author(s): Donald A. Byrd; Vriddhachalam K. Viswanathan; Gregg L. Woodfin; William W. Horn; Vito J. Lazazzera; Rodney A. Schmell
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

At Los Alamos National Laboratory, we are preparing to image submicrometer-size features using the Free Electron Laser (FEL) operating at 248 nm. This article describes the optical transfer systems that were designed to relay the ultraviolet (UV) optical output of the FEL, resulting in expected imaged feature sizes in the range 0.3 - 0.5 micrometers . Nearly all optical subsystems are reflective, and once the coatings were optimized any optical wavelength could be used. All refractive optics were UV-grade fused silica. The optical design, engineering, and manufacture of the various component systems are described along with some experimental results.

Paper Details

Date Published: 13 August 1993
PDF: 16 pages
Proc. SPIE 1868, Laser Resonators and Coherent Optics: Modeling, Technology, and Applications, (13 August 1993); doi: 10.1117/12.150634
Show Author Affiliations
Donald A. Byrd, Los Alamos National Lab. (United States)
Vriddhachalam K. Viswanathan, Los Alamos National Lab. (United States)
Gregg L. Woodfin, Los Alamos National Lab. (United States)
William W. Horn, Los Alamos National Lab. (United States)
Vito J. Lazazzera, Los Alamos National Lab. (United States)
Rodney A. Schmell, Los Alamos National Lab. (United States)


Published in SPIE Proceedings Vol. 1868:
Laser Resonators and Coherent Optics: Modeling, Technology, and Applications
Anup Bhowmik, Editor(s)

© SPIE. Terms of Use
Back to Top