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Proceedings Paper

Study of excimer-laser direct-projective lithography
Author(s): Haixing Zou; Yudong Zhang
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Paper Abstract

In our experiments, we have found that the velocity of direct projective lithography is very fast, if excimer laser is used. In the system, we use an XeCl excimer laser (laser wavelength 308 nm, laser bandwidth 1 nm, pulse width 40 ns, and pulse energy 300 mJ/pulse) and a 1:1 catadioptric lens used as the projective lens (with NA: 0.35, field size: 40 mm). Optical resist is AZ 1350 J. The laser energy density on the wafer is 6 mJ/cm2. Exposure dose is 300 mJ/cm2. Through the system, we have not only obtained 1.0 micrometers resolution on 0.6 micrometers thickness resist, but also have studied the damage of Cr film in the direct projective lithography.

Paper Details

Date Published: 8 August 1993
PDF: 4 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150489
Show Author Affiliations
Haixing Zou, Shanghai Institute of Optical and Fine Mechanics (China)
Yudong Zhang, Shanghai Institute of Optical and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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