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Proceedings Paper

Lithographic performance of a new generation i-line optical system: a comparative analysis
Author(s): Gary E. Flores; Warren W. Flack; Lynn Dwyer
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Paper Abstract

A new generation i-line optical stepper utilizing the established benefits of the 1x Wynne- Dyson lens design has been developed for mix-and-match lithography. Based on the advantages of cost of ownership and high throughput capability, the Ultratech 2244i was specifically designed as a cost effective approach to complement high NA reduction steppers in a mix-and-match environment, especially for high volume DRAM and ASIC manufacturing. This system features an ultra-large image field of 22 X 44 mm with a 0.32 numerical aperture lens with an illumination bandwidth of 20 nanometers (355 to 375 nm). As a result, this system provides 0.8 micrometers manufacturing capability. These features provide improved critical dimension (CD) interference effects and superior depth-of-focus for the 2244i.

Paper Details

Date Published: 8 August 1993
PDF: 15 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150487
Show Author Affiliations
Gary E. Flores, Ultratech Stepper Corp. (United States)
Warren W. Flack, Ultratech Stepper Corp. (United States)
Lynn Dwyer, Ultratech Stepper Corp. (United States)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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