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Proceedings Paper

Design and development of a prototype excimer-laser-based stepper
Author(s): Dohoon Kim; Boo-Yeon Choi; Ki Ro Chung; Chi-Hoon Jun; Won-Ick Jang; Youn Tae Kim; Jong-Hyun Lee; Heung Ok Park
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Paper Abstract

This paper describes the design and development of a KrF excimer laser stepper and discusses the detailed system parameters and characterization data obtained from the performance test. We have developed a deep UV step-and-repeat system, operating at 248 nm, by retrofitting commercial modules such as a KrF excimer laser, precision wafer stage and fused silica illumination and 5X projection optics of numerical aperture 0.42. What we have developed, to the basic structure, are wafer alignment optics, reticle alignment system, autofocusing/leveling mechanisms and an environment chamber. Finally, all these subsystems were integrated under the control of microprocessor-based controllers and a computer.

Paper Details

Date Published: 8 August 1993
PDF: 7 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150486
Show Author Affiliations
Dohoon Kim, Electronics and Telecommunications Research Institute (South Korea)
Boo-Yeon Choi, Electronics and Telecommunications Research Institute (South Korea)
Ki Ro Chung, Electronics and Telecommunications Research Institute (South Korea)
Chi-Hoon Jun, Electronics and Telecommunications Research Institute (South Korea)
Won-Ick Jang, Electronics and Telecommunications Research Institute (South Korea)
Youn Tae Kim, Electronics and Telecommunications Research Institute (South Korea)
Jong-Hyun Lee, Electronics and Telecommunications Research Institute (South Korea)
Heung Ok Park, Electronics and Telecommunications Research Institute (South Korea)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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