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Proceedings Paper

Response surface modeling of rim phase-shift masks
Author(s): Richard D. Holscher; Bruce W. Smith; Steve K. Brainerd
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Paper Abstract

The use of statistically designed experiments provides an efficient method of investigating a lithographic process. Lithographic simulators have also been used as a tool in the investigation of these processes. This paper provides a general methodology for conducting designed experiments in which a computer simulator is the tool used as the data collection device. The rim shifter is a phase shifting technique that was investigated. Response surfaces measuring depth of focus were generated from simulated data. The resolution and depth of focus capabilities of this phase shift technique were also measured by both experimental and simulated data.

Paper Details

Date Published: 8 August 1993
PDF: 11 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150483
Show Author Affiliations
Richard D. Holscher, Rochester Institute of Technology (United States)
Bruce W. Smith, Rochester Institute of Technology (United States)
Steve K. Brainerd, Rochester Institute of Technology (United States)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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