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Proceedings Paper

Calibration of lithography simulator by using subresolution patterns
Author(s): Shay Kaplan; Linard Karklin
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Paper Abstract

In this paper, we used actual experimental results to calibrate the 3-D lithography simulator SOLID, a lithography simulator with proven ability to accurately simulate sub-resolution patterns. The RS1 Discover DOE software was used to determine optimum values for the uncertain parameters. The tuned simulator was then used to predict behavior both regular and sub-resolution patterns. The simulation results were compared to actual process data for the final verification.

Paper Details

Date Published: 8 August 1993
PDF: 10 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150482
Show Author Affiliations
Shay Kaplan, National Semiconductor (Israel)
Linard Karklin, Silvaco International (United States)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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