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Proceedings Paper

Comparison of scalar and vector diffraction modeling for deep-UV lithography
Author(s): Bruce W. Smith; Donis G. Flagello; Joseph R. Summa; Lynn F. Fuller
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Paper Abstract

This paper describes investigations into scalar and vector diffraction modeling for 248 nm lithography. An experimental design approach was used to study the effects and interactions of coherence, polarization, and numerical aperture on a resist feature response. An exposure latitude response to achieve 10% linewidth control with +/- 0.3 micron of defocus was utilized. Both vector and scalar diffraction models were used to simulate process runs. Experimental comparisons were made using a variable NA, variable coherence deep-UV projection system, adapted for control of polarization at the aperture of the mask. Exposure latitude response surfaces are presented, along with details on isolated process runs.

Paper Details

Date Published: 8 August 1993
PDF: 11 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150481
Show Author Affiliations
Bruce W. Smith, Rochester Institute of Technology (United States)
Donis G. Flagello, IBM Thomas J. Watson Research Ctr. (United States)
Joseph R. Summa, Rochester Institute of Technology (United States)
Lynn F. Fuller, Rochester Institute of Technology (United States)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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