Share Email Print
cover

Proceedings Paper

Improvement of the physical-optics approximation for topography simulation in optical lithography
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper discusses various techniques to implement the physical-optics approximation for topography simulation. The accuracies of the various techniques are examined by comparison with the results of a rigorous, time- domain method. It is shown that inter-surface multiple scattering effects and near-field diffraction effects in intra-surface multiple scattering must both be taken into account to obtain satisfactory agreement with the time-domain method. A technique to correct for the effects of non-physical-optics edge currents is also described.

Paper Details

Date Published: 8 August 1993
PDF: 14 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150480
Show Author Affiliations
Michael S. Yeung, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

© SPIE. Terms of Use
Back to Top