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Proceedings Paper

Effect of g-line filter transmission characteristics on dose matching between monochromatic exposure tools in a production environment
Author(s): James R. Przybyla; Tim Emery; Hussein Mukaled
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Paper Abstract

To maintain critical dimension control in a production environment, it is essential that all wafer steppers have their effective doses matched. Because high pressure Mercury illumination sources actually have a bandwidth of 10 nm and typical resist absorbance curves are dropping steeply around the 436 nm region, differences between G-line filters can cause exposure shifts between steppers. Functional exposure differences on dose to clear wafers of 9% are explained by combining integrator and G-line filter spectrophotometer tests on ten .54 NA wafer steppers.

Paper Details

Date Published: 8 August 1993
PDF: 12 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150475
Show Author Affiliations
James R. Przybyla, Hewlett-Packard Co. (United States)
Tim Emery, Hewlett-Packard Co. (United States)
Hussein Mukaled, Nikon Precision Inc. (United States)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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