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Proceedings Paper

Efficient spectral narrowing, tuning, and stabilization devices for KrF laser used in microlithography
Author(s): Alexander N. Novoselov; Victor G. Nikiforov; Alexander F. Silnitsky; Boris F. Trinchuk
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Paper Abstract

Efficient spectral narrowing, tuning, and stabilization devices characterized by improved energy efficiency and operating parameters have been constructed. The devices are used with KrF lasers intended for submicron lithography. Up to 5 pm spectral line narrowing is provided by two Fabry Perot etalons with thoroughly optimized parameters. They permit us to achieve unprecedented spectral narrowing energy efficiency of 50%. A special device based on a passively stabilized reference Fabry-Perot etalon is used for laser wavelength stabilization within 1 pm. A unique optical scheme of interference pattern formation is realized in the device; the laser wavelength is controlled by spatial location of fringes. The device also features precision wavelength tuning (approximately 0.1 pm), better resistance to electromagnetic noise, and higher operating characteristics.

Paper Details

Date Published: 8 August 1993
PDF: 7 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150470
Show Author Affiliations
Alexander N. Novoselov, Scientific Research Institute ZENIT (Russia)
Victor G. Nikiforov, Scientific Research Institute ZENIT (Russia)
Alexander F. Silnitsky, Scientific Research Institute ZENIT (Russia)
Boris F. Trinchuk, Scientific Research Institute ZENIT (Russia)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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