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Proceedings Paper

High-resolution spectral studies and the absolute-wavelength calibration of a KrF excimer laser for microlithography
Author(s): Igor V. Fomenkov; Richard L. Sandstrom
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Paper Abstract

We present measurements of the spectral characteristics of a spectrally narrowed KrF excimer laser designed for use in advanced, high numerical aperture deep UV steppers. Using a specially designed high resolution grating spectrometer, we measured a bandwidth of 1.06 pm FWHM, with 95% of the energy contained within a 3.15 pm band (6 W output power). Using an atomic iron emission line ((lambda) equals 248.3271 nm), the grating spectrometer, and the laser's etalon based wavemeter, the absolute wavelength was calibrated to an accuracy better than 0.1 pm.

Paper Details

Date Published: 8 August 1993
PDF: 8 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150469
Show Author Affiliations
Igor V. Fomenkov, Cymer Laser Technologies, Inc. (United States)
Richard L. Sandstrom, Cymer Laser Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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