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Proceedings Paper

Effect of duty ratio of line and space in phase-shifting lithography
Author(s): Junji Miyazaki; Atsumi Yamaguchi; Keiji Fujiwara; Nobuyuki Yoshioka; Hiroaki Morimoto; Katsuhiro Tsukamoto
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Paper Abstract

This paper discusses the effect of duty ratio of line and space patterns and the coherency of illumination for the projection system on the lithographic characteristics, which must be taken into consideration in designing LSI patterns with an alternated type phase-shifting method. It was found that the alternated phase-shifting method improved the DOF for space patterns using a width smaller than the line width. On the contrary, there was no effect for narrow line patterns when the space width was larger than twice the line width. It was also found that the DOF became larger, when the coherency became higher using both the alternated and the conventional mask for line patterns having a width smaller than the space width. It is concluded that a high coherency must be chosen for the phase-shifting method.

Paper Details

Date Published: 8 August 1993
PDF: 9 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150462
Show Author Affiliations
Junji Miyazaki, Mitsubishi LSI Lab. (Japan)
Atsumi Yamaguchi, Mitsubishi LSI Lab. (Japan)
Keiji Fujiwara, Mitsubishi LSI Lab. (Japan)
Nobuyuki Yoshioka, Mitsubishi LSI Lab. (Japan)
Hiroaki Morimoto, Mitsubishi LSI Lab. (Japan)
Katsuhiro Tsukamoto, Mitsubishi LSI Lab. (Japan)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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