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Proceedings Paper

Self-aligned rim-type phase-shift mask fabrication by backside exposure
Author(s): David S. O'Grady; Stan P. Bajuk; Edward T. Smith
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Paper Abstract

A novel technique to fabricate a rim-type phase-shifting mask has been developed by exposing the back side of the mask with light. Such a mask requires no significant modification to conventional design layouts and improves aerial image contrast and depth of focus over that of a conventional reticle. The technique is self-aligning, and requires only one data writing level. Results for the simple and highly controllable process are presented, characterizing rim size versus dose and rim image uniformity, linearity, fidelity, and controllability.

Paper Details

Date Published: 8 August 1993
PDF: 10 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150457
Show Author Affiliations
David S. O'Grady, IBM Corp. (United States)
Stan P. Bajuk, IBM Corp. (United States)
Edward T. Smith, Harvard Univ. (United States)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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