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Proceedings Paper

Overlay distortions in wafer-scale integration lithography
Author(s): Warren W. Flack
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Paper Abstract

Wafer scale integration (WSI) lithography is the technique used to fabricate ultra large scale integration (ULSI) integrated circuits significantly greater in size than current products. Applications for WSI lithography include large solid state detector arrays, large area liquid crystal displays, high speed mainframe supercomputers, and large random access memories. The lithography technology required to manufacture these devices is particularly challenging, requiring stringent control of both submicron critical dimensions and accurate alignment of level to level device patterns over large chip areas.

Paper Details

Date Published: 8 August 1993
PDF: 12 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150451
Show Author Affiliations
Warren W. Flack, TRW Inc. (United States)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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