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Proceedings Paper

Phase-contrast lithography
Author(s): Chris A. Mack
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Paper Abstract

This paper analyzes theoretically the potential for a novel approach to lithographic imaging: phase contrast lithography. In this approach, a unique chromeless phase shifting mask is combined with a specific phase filter at the pupil plane to produce high contrast images projected onto the wafer. Like the phase contrast microscope, the pupil filter is designed to phase-shift the zero order diffracted light by some angle. The design of the chromeless mask is purposely kept simple using essentially the same design information as for a conventional chrome/glass mask. Initial analysis of the phase contrast lithography technique reveals some problems, especially proximity effects.

Paper Details

Date Published: 8 August 1993
PDF: 9 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150448
Show Author Affiliations
Chris A. Mack, FINLE Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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