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Proceedings Paper

New method of tilted illumination using grating mask: advanced tilted illumination on mask
Author(s): Hoyoung Kang; Chul Hong Kim; Woo-Sung Han; Young-Bum Koh; Moon-Yong Lee
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Paper Abstract

A modified illumination method recently developed is known to improve resolution and depth of focus (DOF) dramatically. But, it requires substantial modification in the optical projection system and has some problems such as low throughput caused by low intensity and poor uniformity. To solve these problems, we developed a new illumination technique, named advanced tilted illumination on mask (ATOM) using phase grating which is the same, in principle, as quadrupole illumination but a very simple approach with little loss of intensity. In our experiments, we obtained the best resolution of 0.28 micrometers and 2.0 micrometers DOF for 0.36 micrometers feature size with an i-line stepper, which is two times as wide as that of a conventional illumination method. We also obtained 0.22 micrometers resolution and 2.0 micrometers DOF for 0.28 micrometers with an 0.45 NA KrF excimer laser stepper. For complex device patterns, a more than 1.5 times wider DOF could be obtained compared to the conventional illumination method. From these results, we conclude that second generation of 64 M DRAM with 0.30 micrometers design rule could be printed well with this technology combined with high NA (> 0.5) i-line steppers. With a KrF excimer laser stepper, a 256 M DRAM with a 0.25 micrometers design rule can be printed with the wide DOF.

Paper Details

Date Published: 8 August 1993
PDF: 9 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150427
Show Author Affiliations
Hoyoung Kang, Samsung Electronics Co. (South Korea)
Chul Hong Kim, Samsung Electronics Co. (South Korea)
Woo-Sung Han, Samsung Electronics Co. (South Korea)
Young-Bum Koh, Samsung Electronics Co. (South Korea)
Moon-Yong Lee, Samsung Electronics Co. (South Korea)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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