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Proceedings Paper

Exposure alignment compensation method for rim phase-shifting mask fabrication
Author(s): Minoru Sugawara; Hiroichi Kawahira; Akihiro Ogura; Satoru Nozawa
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Paper Abstract

A phase shifting mask exposure alignment compensation method for edge enhancement (PEACE) is proposed as a newly developed rim phase shifting mask fabrication method. In the PEACE method, a compensation pattern with 180 degree phase shift against rim phase is arranged adjacent to the rim pattern. The compensation pattern can effectively reduce secondary peak intensity by a destructive interference which will bring about a considerable enhancement of the registration latitude at the second layer electron beam (EB) exposure. Two PEACE methods, PEACE-1 and PEACE-2, are introduced subject to different compensation pattern arrangements. In the PEACE-1 method, at the second layer EB exposure, the compensation pattern is formed automatically adjacent to one or two rim sides with a width proportional to registration error. For the PEACE-2 method, the compensation pattern region is originally designed peripherally around the rim pattern so as to give no change of inherent rim area even with a considerable registration error.

Paper Details

Date Published: 8 August 1993
PDF: 11 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150426
Show Author Affiliations
Minoru Sugawara, Sony Corp. (Japan)
Hiroichi Kawahira, Sony Corp. (Japan)
Akihiro Ogura, Sony Corp. (Japan)
Satoru Nozawa, Sony Corp. (Japan)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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