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Proceedings Paper

New mask technique for optical lithography--dummy diffraction mask
Author(s): Yong-Ho Oh; Hyung Joun Yoo; Byung-Sun Park; Zion Cha; Hyo-Joong Kim; Young Jin Jeon
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Paper Abstract

A new mask technique for resolution improvement and depth of focus enhancement is suggested and demonstrated with the simulation and experimental results. The structure of our suggestion has a dummy diffraction layer with simple grating patterns in addition to the main mask for patterning. The lithographic performance of the main mask pattern is largely enhanced and the fabrication of the mask has no critical problems. Through the detailed theoretical expansion of the optics for the new structure, simulation of the aerial image is carried out. And the experiments verify the results of simulation.

Paper Details

Date Published: 8 August 1993
PDF: 12 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150425
Show Author Affiliations
Yong-Ho Oh, Electronics and Telecommunications Research Institute (South Korea)
Hyung Joun Yoo, Electronics and Telecommunications Research Institute (South Korea)
Byung-Sun Park, Electronics and Telecommunications Research Institute (South Korea)
Zion Cha, Electronics and Telecommunications Research Institute (South Korea)
Hyo-Joong Kim, Electronics and Telecommunications Research Institute (South Korea)
Young Jin Jeon, Electronics and Telecommunications Research Institute (South Korea)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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