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Proceedings Paper

Effect of lens aberration on oblique-illumination stepper system
Author(s): Pei-yang Yan; Qi-De Qian; Joseph C. Langston
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Paper Abstract

In this paper, detailed simulation and some experimental studies on stepper lens aberration effect in the case of oblique illumination source are presented. The results are compared to that of conventional illumination source. Due to the unique feature of oblique illumination source imaging, i.e., imaging by using only zero and first diffraction order light, both stepper resolution limit and depth of focus (DOF) are extended. As a result, the effect of lens aberration in resist printing are also different from that of conventional illumination source. Unlike the conventional illumination source, the net effect of stepper lens aberration in resist printing depends not only on both the amount and type of the lens aberration, but also on the mask feature pattern. In the case of lens distortion, unlike the other types of lens aberration, the oblique illumination source does not show any improvement as compared to that of conventional illumination source. It does not show pattern dependent distortion either. In the experiment, an effect of a stepper lens aberration in resist printing for both conventional illumination and quadrapole illumination sources (mostly astigmatism) were measured. The results were in agreement with our simulation results.

Paper Details

Date Published: 8 August 1993
PDF: 14 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150422
Show Author Affiliations
Pei-yang Yan, Intel Corp. (United States)
Qi-De Qian, Intel Corp. (United States)
Joseph C. Langston, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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