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Proceedings Paper

Off-axis illumination--working principles and comparison with alternating phase-shifting masks
Author(s): Burn Jeng Lin
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Paper Abstract

The working principles of off-axis illumination to improve the resolution and depth of focus of optical projection imaging and some foreseeable problems are explained in pictorial and analytical forms in terms of coherent illumination systems. Partial coherent illuminations are used to compare the imaging performance of off-axis illumination systems in the form of quadrapole and ring with the alternating phase-shifting mask technique. Other aspects between these two enhancement techniques are also compared. Some unexpected conclusions have been drawn.

Paper Details

Date Published: 8 August 1993
PDF: 12 pages
Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150417
Show Author Affiliations
Burn Jeng Lin, Linnovation, Inc. (United States)

Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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