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Proceedings Paper

FIB repair of 5x reticles and effects on IC quality
Author(s): Philip D. Prewett; Brian Martin; A. W. Eastwood; John G. Watson
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Paper Abstract

Focused ion beam repair of opaque defects on 5X reticles cause a post repair stain due mainly to gallium ion implantation in the surface of the quartz substrate. The effects of these stains have been investigated through printability tests using a g-line optical lithography process. In some cases the effect of the post repair stain is worse than that of the original defect, highlighting the need for effective antistain processes for use in conjunction with FIB repair.

Paper Details

Date Published: 4 August 1993
PDF: 10 pages
Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); doi: 10.1117/12.148984
Show Author Affiliations
Philip D. Prewett, Rutherford Appleton Lab. (United Kingdom)
Brian Martin, GEC Plessey Semiconductors Ltd. (United Kingdom)
A. W. Eastwood, Rutherford Appleton Lab. (United Kingdom)
John G. Watson, Rutherford Appleton Lab. (United Kingdom)


Published in SPIE Proceedings Vol. 1926:
Integrated Circuit Metrology, Inspection, and Process Control VII
Michael T. Postek, Editor(s)

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