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Proceedings Paper

Measurement of phase-shift masks
Author(s): Fang Cheng Chang; Gordon S. Kino; William K. Studenmund; Stanley S. C. Chim; Ching-Hua Chou
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Paper Abstract

We discuss in this paper the use of the confocal microscope and an interferometric microscope for measurement of phase-shift masks. It is shown that phase measurements are more accurate than intensity measurements for determining the depth and slope of the sides of a notch. Results obtained on an isotropically etched mask, with curved bottom corners, are predicted well by our imaging theory. Solid immersion lens techniques for observing a mask from the flat side are demonstrated.

Paper Details

Date Published: 4 August 1993
PDF: 8 pages
Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); doi: 10.1117/12.148974
Show Author Affiliations
Fang Cheng Chang, Stanford Univ. (United States)
Gordon S. Kino, Stanford Univ. (United States)
William K. Studenmund, Stanford Univ. (United States)
Stanley S. C. Chim, Stanford Univ. (United States)
Ching-Hua Chou, Stanford Univ. (United States)

Published in SPIE Proceedings Vol. 1926:
Integrated Circuit Metrology, Inspection, and Process Control VII
Michael T. Postek, Editor(s)

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