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Proceedings Paper

Nonlinearity in scanning electron microscope critical dimension measurements introduced by the edge detection algorithm
Author(s): Robert R. Hershey; Michael B. Weller
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Paper Abstract

This paper discusses nonlinear behavior in SEM CD measurements stemming from the interaction of the edge detection algorithm and systematic changes in the appearance of the secondary electron signal. A first-order theory is developed which describes the effect of changes in apparent sidewall slope and baseline level on common edge detection algorithms. Specifically the theory predicts nonlinear behavior for linear approximation and threshold edge detection algorithms. Experimental verification of the effect is presented. Systematic increases in linewidth of 10% are frequently encountered in practice when making measurements in the sub 0.75 micrometers regime.

Paper Details

Date Published: 4 August 1993
PDF: 8 pages
Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); doi: 10.1117/12.148943
Show Author Affiliations
Robert R. Hershey, Motorola, Inc. (United States)
Michael B. Weller, Motorola, Inc. (United States)


Published in SPIE Proceedings Vol. 1926:
Integrated Circuit Metrology, Inspection, and Process Control VII
Michael T. Postek, Editor(s)

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