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Proceedings Paper

Photothermal comparison of reactive low-voltage ion-plated and electron-beam-deposited TiO2 thin films
Author(s): Zhouling Wu; Eckart Matthias; A. Messinger; Klaus Bange
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Paper Abstract

TiO2 thin films of different thicknesses were prepared by conventional electron beam deposition (EBD) and reactive low-voltage ion-plating (RLVIP) techniques. These samples were designed to investigate the thickness dependent optical and thermal properties of the TiO2 coatings and the corresponding damage thresholds. In this paper we present a detailed comparison of the two groups of samples by using various photothermal techniques. The data reported include thermal conductivity, defect density, optical absorption, laser damage threshold, as well as laser conditioning effect by using Ar+ laser irradiation. The general trend shown by the data is that the ion-plated samples have higher absorption, lower damage threshold, yet better thermal conductivity, lower defect density, and almost perfect stability under Ar+ laser irradiation.

Paper Details

Date Published: 24 June 1993
PDF: 14 pages
Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); doi: 10.1117/12.147428
Show Author Affiliations
Zhouling Wu, Freie Univ. Berlin (Germany)
Eckart Matthias, Freie Univ. Berlin (Germany)
A. Messinger, Schott Glaswerke (Germany)
Klaus Bange, Schott Glaswerke (Germany)


Published in SPIE Proceedings Vol. 1848:
24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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