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Proceedings Paper

Surface morphology, phase characterization, and stability of solution-deposited zirconia films
Author(s): Gregory J. Exarhos; Nancy J. Hess; Susanne Wood
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Paper Abstract

Deposition of zirconia films and multilayers from aqueous solution involves complexation of the precursor metal nitrate with a water soluble organic complexant. Following spin casting and associated water evaporation, an amorphous organic film is formed. Heat treatment initiates oxidation of the organic phase by nitrate, leaving behind a high index stoichiometric oxide film (n equals 2.01). Small grain sizes (approximately equals 50 nm) observed by AFM analysis stabilize the cubic and tetragonal crystalline phases of zirconia which are identified using XRD and Raman spectroscopy. Annealing above 700 degree(s)C causes recrystallization of these films to the monoclinic phase. A fluorescence method based upon introduction of a Sm+3 dopant into the film is shown to be a sensitive probe of the inherent crystalline phase and phase homogeneity and is used to evaluate crystalline phases in laser damaged coatings. These films exhibit visible damage areas upon irradiation at 532 nm with pulse energies in excess of 10 J/cm2. An increase in grain size accompanied by the presence of a disordered phase of zirconia is observed. Results are compared with damage regions induced in similarly irradiated PVD zirconia films.

Paper Details

Date Published: 24 June 1993
PDF: 13 pages
Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); doi: 10.1117/12.147407
Show Author Affiliations
Gregory J. Exarhos, Battelle Pacific Northwest Lab. (United States)
Nancy J. Hess, Battelle Pacific Northwest Lab. (United States)
Susanne Wood, Washington State Univ. (United States)


Published in SPIE Proceedings Vol. 1848:
24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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