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Proceedings Paper

Control of debris production of laser plasma sources with high-average XUV power
Author(s): Fred Bijkerk; Eric Louis; Leonid A. Shmaenok; Harm-Jan Voorma; Marnix J. van der Wiel; I. C. Edmond Turcu; Gregory J. Tallents
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Paper Abstract

Recent investigations on methods to eliminate the contamination of high power laser plasma sources are reviewed. The use of separate methods such as a buffer gas environment or thin tape targets suppresses the debris yield drastically up to a factor of 103. A combination of this with other effective as well as practically convenient methods (use of debris angular characteristics, a rotating shutter, or thin UV filters) provides a truly contamination-free XUV source. As an example of a novel high power source we describe the performance of a 1.5 J KrF laser designed to drive a laser plasma XUV source. The laser was used to generate narrowband XUV radiation at 18 nm. A conversion efficiency of >= 1.4% in a bandwidth of 6% was measured, demonstrating the feasibility of laser plasma sources for applications such as XUV projection lithography, requiring high average power.

Paper Details

Date Published: 24 June 1993
PDF: 5 pages
Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); doi: 10.1117/12.147395
Show Author Affiliations
Fred Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Eric Louis, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Leonid A. Shmaenok, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Harm-Jan Voorma, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Marnix J. van der Wiel, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
I. C. Edmond Turcu, Rutherford Appleton Lab. (United Kingdom)
Gregory J. Tallents, Rutherford Appleton Lab. (United Kingdom)


Published in SPIE Proceedings Vol. 1848:
24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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