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Proceedings Paper

XUV projection lithography: is optical surface contamination an important limitation?
Author(s): Marion L. Scott; Brian Emerson Newnam
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Paper Abstract

We report results of an extensive set of oxide and carbon film contamination experiments with Al, Si, Rh, and Ag films and surfaces to quantify the film growth rates and parameter dependencies. These four materials were selected initially because they exhibit total external reflectance at moderate angles of incidence, e.g., > 45 degree(s), as needed for high- reflectance multifacet mirrors. In addition, these materials are candidate films for single- surface and multilayer mirrors at normal incidence as well as transmission filters in XUV projection lithography optical systems. (Abstract only)

Paper Details

Date Published: 24 June 1993
PDF: 2 pages
Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); doi: 10.1117/12.147393
Show Author Affiliations
Marion L. Scott, Los Alamos National Lab. (United States)
Brian Emerson Newnam, Los Alamos National Lab. (United States)


Published in SPIE Proceedings Vol. 1848:
24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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