Share Email Print
cover

Proceedings Paper

Optical degradation issues for XUV projection lithography systems
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We review the degradation susceptibility of the various optical components proposed for use in XUV projection lithography systems at 13 - 20 nm. Contamination by laser plasma target debris and carbonaceous films are two primary hazards that must be essentially nullified. Pertinent experimental results of a number of researchers illustrate the present status.

Paper Details

Date Published: 24 June 1993
PDF: 9 pages
Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); doi: 10.1117/12.147391
Show Author Affiliations
Brian Emerson Newnam, Los Alamos National Lab. (United States)


Published in SPIE Proceedings Vol. 1848:
24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

© SPIE. Terms of Use
Back to Top