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Proceedings Paper

Optical degradation issues for XUV projection lithography systems
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Paper Abstract

We review the degradation susceptibility of the various optical components proposed for use in XUV projection lithography systems at 13 - 20 nm. Contamination by laser plasma target debris and carbonaceous films are two primary hazards that must be essentially nullified. Pertinent experimental results of a number of researchers illustrate the present status.

Paper Details

Date Published: 24 June 1993
PDF: 9 pages
Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); doi: 10.1117/12.147391
Show Author Affiliations
Brian Emerson Newnam, Los Alamos National Lab. (United States)


Published in SPIE Proceedings Vol. 1848:
24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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