Share Email Print
cover

Proceedings Paper

Development of a polycapillary collimator for point-source x-ray lithography
Author(s): Michael H. Vartanian; David M. Gibson; Robert D. Frankel; Jerry P. Drumheller
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A collimated radiation field is desired in order to use x-ray lithography to replicate ULSI chips with sub-0.25 micrometers features. Additional field specifications include uniformity of x-ray intensity (+/- 1%), penumbral blur (5 mrad), field size greater than 25 mm X 25 mm, and high x-ray transmission efficiency. Introduction of a multi-polycapillary x-ray wave guide collimator between a laser plasma x-ray source and silicon wafer can produce such a field. We describe progress toward the design and fabrication of such a collimator. We have measured the soft x-ray transmission efficiency and divergence of straight and bent glass polycapillaries composed of capillaries in the 17 - 25 micrometers diameter range, using a laser produced plasma x-ray spectrum peaked at 14 angstroms. Transmission results conform well to theoretical predictions. Experimental results have been used to develop a preliminary design for a polycapillary collimeter structure that can be used with Hampshire Instruments' x-ray lithography stepper systems. The projected x-ray field characteristics, and throughput are discussed.

Paper Details

Date Published: 24 June 1993
PDF: 11 pages
Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); doi: 10.1117/12.146531
Show Author Affiliations
Michael H. Vartanian, X-Ray Optical Systems, Inc. (United States)
David M. Gibson, X-Ray Optical Systems, Inc. (United States)
Robert D. Frankel, Hampshire Instruments, Inc. (United States)
Jerry P. Drumheller, Hampshire Instruments, Inc. (United States)


Published in SPIE Proceedings Vol. 1924:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
David O. Patterson, Editor(s)

© SPIE. Terms of Use
Back to Top