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Proceedings Paper

Comparative study of MEBES III and CORE 2564 performance in a manufacturing environment
Author(s): Theron L. Felmlee; Vijaya N.V. Raghavan
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Paper Abstract

Many of the same considerations that were instrumental in providing the state-of-the-art e- beam process were implemented in the recent installation of the ETEC CORE 2564 laser-beam mask/reticle lithography system and the associated process setup. The possession of two high- performance mask/reticle production processes created a need to perform a comparative investigation of the manufacturing performance of the two systems and their associated processes. This study points out some of the manufacturing strengths and weaknesses of these two distinctly different mask/reticle production processes. This is done on the basis of each system's performance to published specifications, (relative to each other) and on the manufacturing process capability characteristics of the finished mask/reticle.

Paper Details

Date Published: 24 June 1993
PDF: 14 pages
Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); doi: 10.1117/12.146529
Show Author Affiliations
Theron L. Felmlee, Hewlett-Packard Photomask (United States)
Vijaya N.V. Raghavan, Hewlett-Packard Photomask (United States)

Published in SPIE Proceedings Vol. 1924:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
David O. Patterson, Editor(s)

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