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Proceedings Paper

Properties of thin SiC membrane for x-ray mask
Author(s): Tsutomu Shoki; Hiroyuki Nagasawa; Hiroyuki Kosuga; Yoichi Yamaguchi; Noromichi Annaka; Isao Amemiya; Osamu Nagarekawa
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Paper Abstract

We have investigated the effects of film thickness, anti-reflective (AR) coating and surface roughness on the optical transparency of silicon carbide (SiC) membrane. Peak transmittances monotonously increased as the thickness decreased. The transmittance at 633 nm for 1.05 micrometers thick SiC membrane adjusted by reactive ion etching was 70%, and increased up to 80% by an AR coating. SiC membrane with extremely smooth surface of 0.12 nm (Ra) has been obtained by polishing, and had peak transmittances of 69% and 80% at 633 nm for 2.0 micrometers and 1.0 micrometers in thickness, respectively. Poly-crystalline (beta) -SiC membrane in the suitable tensile stress range of 0.3 to 2.0 X 108 Pa and with high Young's modulus of 4.5 X 1011 Pa has been prepared by a hot wall type low pressure chemical vapor deposition, and been found to need to have thickness over 0.7 micrometers to maintain sufficient mechanical strength in processing.

Paper Details

Date Published: 24 June 1993
PDF: 7 pages
Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); doi: 10.1117/12.146526
Show Author Affiliations
Tsutomu Shoki, Hoya Corp. (Japan)
Hiroyuki Nagasawa, Hoya Corp. (Japan)
Hiroyuki Kosuga, Hoya Corp. (Japan)
Yoichi Yamaguchi, Hoya Corp. (Japan)
Noromichi Annaka, Hoya Corp. (Japan)
Isao Amemiya, Hoya Corp. (Japan)
Osamu Nagarekawa, Hoya Corp. (Japan)

Published in SPIE Proceedings Vol. 1924:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
David O. Patterson, Editor(s)

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