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Proceedings Paper

Characteristics of the spherical pinch plasma radiation source (SPX II) for x-ray, UV, and deep-UV lithography
Author(s): Shridar Aithal; Emilio Panarella; M. Lamari; B. Hilko; Robert B. McIntosh
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Paper Abstract

The concept of generating soft X-rays using a Spherical Pinch source was presented at the 1991 and 1992 SPIE conferences. In this paper we present the electrical specifications, plasma and radiation characteristics, system operation and maintenance for the SPX II prototype machine. In addition, we present the X-ray output power levels and times of exposure to attain a given dose level for different input electrical energies of the machine. Finally, we provide a status report on the construction of a new upscale version (SPX III) of the Spherical Pinch X- ray source which is being built as an industrial prototype for application in X-ray microlithography.

Paper Details

Date Published: 24 June 1993
PDF: 9 pages
Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); doi: 10.1117/12.146519
Show Author Affiliations
Shridar Aithal, Advanced Laser and Fusion Technology, Inc. (Canada)
Emilio Panarella, Advanced Laser and Fusion Technology, Inc. (Canada)
M. Lamari, Advanced Laser and Fusion Technology, Inc. (Canada)
B. Hilko, Advanced Laser and Fusion Technology, Inc. (Canada)
Robert B. McIntosh, Horizon Technology Group, Inc. (United States)


Published in SPIE Proceedings Vol. 1924:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
David O. Patterson, Editor(s)

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