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Proceedings Paper

Helios compact synchrotron x-ray source: one year of operation at ALF
Author(s): David E. Andrews; Charles N. Archie
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Paper Abstract

The first Helios compact synchrotron x-ray source began routine operation at the IBM Advanced Lithography Facility (ALF) in East Fishkill, NY, in January of 1992. This paper presents data on the ring's performance during its initial fourteen months of operation.

Paper Details

Date Published: 24 June 1993
PDF: 5 pages
Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); doi: 10.1117/12.146517
Show Author Affiliations
David E. Andrews, Oxford Instruments (United States)
Charles N. Archie, IBM Technology Products (United States)


Published in SPIE Proceedings Vol. 1924:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
David O. Patterson, Editor(s)

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