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Proceedings Paper

0.25-um x-ray mask repair with focused ion beams
Author(s): Diane K. Stewart; Thomas K. Olson; Billy Ward
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Paper Abstract

A focused ion beam system has been developed to repair 0.25 micrometers proximity print X-ray masks. The system is distinguished from a 0.5 micrometers mask repair tool with the addition of a Micrion designed column, differential laser interferometry, thermal management, and gold deposition hardware. These subsystems contribute to the overall tool performance so that the defects can be located, imaged and repaired to industry specifications. We discuss the functionality of the repair tool and present results from inspection and repair of actual masks.

Paper Details

Date Published: 24 June 1993
PDF: 14 pages
Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); doi: 10.1117/12.146497
Show Author Affiliations
Diane K. Stewart, Micrion Corp. (United States)
Thomas K. Olson, Micrion Corp. (United States)
Billy Ward, Micrion Corp. (United States)


Published in SPIE Proceedings Vol. 1924:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
David O. Patterson, Editor(s)

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